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Mueller matrix ellipsometry of artificial non-periodic line edge roughness in presence of finite numerical apertureConference on Metrology, Inspection, and Process Control for Microlithography XXV, Feb 2011, San Jose, United States. pp.19, ⟨10.1117/12.879518⟩
Conference papers
hal-00757380v1
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Plasma nanotexturing of silicon surfaces for photovoltaics applications: influence of initial surface finish on the evolution of topographical and optical propertiesOptics Express, 2017, 25 (24), ⟨10.1364/OE.25.0A1057⟩
Journal articles
hal-01640105v1
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Generalized ellipsometry of artificially designed line width roughnessThin Solid Films, 2011, 519, pp.2633-2636. ⟨10.1016/J.TSF.2010.11.085⟩
Journal articles
istex
hal-00757371v1
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