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Article Dans Une Revue Applied Surface Sciences Advances Année : 2023

Boron activation in silicon thin films grown by PECVD under epitaxial and microcrystalline conditions

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hal-04310582 , version 1 (27-11-2023)

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Antonio Olivares, A. Zamchiy, V.S. Nguyen, P. Roca I Cabarrocas. Boron activation in silicon thin films grown by PECVD under epitaxial and microcrystalline conditions. Applied Surface Sciences Advances, 2023, 18, pp.100508. ⟨10.1016/j.apsadv.2023.100508⟩. ⟨hal-04310582⟩
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