Effects of Roughness on Scatterometry Signatures - École polytechnique Access content directly
Conference Papers Year : 2011

Effects of Roughness on Scatterometry Signatures

T. A. Germer
  • Function : Author
B. C. Bergner
  • Function : Author


We used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line edge roughness (LER). Grating profiles were determined from multiple azimuthal configurations, focusing the incident beam into a 60 μm spot. We used rigorous numerical modeling, taking into account the finite numerical aperture and determining the profile shape using a four trapezoid model for the line profile. Data obtained from the perturbed and unperturbed gratings were fit using the same model, and the resulting root-mean-square error (RMSE) values were compared. The comparison shows an increase in RMSE values for the perturbed grating that can be attributed to the effects of LER.
No file

Dates and versions

hal-00757379 , version 1 (26-11-2012)



M. Foldyna, T. A. Germer, B. C. Bergner. Effects of Roughness on Scatterometry Signatures. FRONTIERS OF CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS 2011, May 2011, Grenoble, France. pp.49-53, ⟨10.1063/1.3657865⟩. ⟨hal-00757379⟩
127 View
0 Download



Gmail Mastodon Facebook X LinkedIn More