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Conference Papers Year : 2011

Effects of Roughness on Scatterometry Signatures

T. A. Germer
  • Function : Author
B. C. Bergner
  • Function : Author

Abstract

We used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line edge roughness (LER). Grating profiles were determined from multiple azimuthal configurations, focusing the incident beam into a 60 μm spot. We used rigorous numerical modeling, taking into account the finite numerical aperture and determining the profile shape using a four trapezoid model for the line profile. Data obtained from the perturbed and unperturbed gratings were fit using the same model, and the resulting root-mean-square error (RMSE) values were compared. The comparison shows an increase in RMSE values for the perturbed grating that can be attributed to the effects of LER.
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Dates and versions

hal-00757379 , version 1 (26-11-2012)

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M. Foldyna, T. A. Germer, B. C. Bergner. Effects of Roughness on Scatterometry Signatures. FRONTIERS OF CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS 2011, May 2011, Grenoble, France. pp.49-53, ⟨10.1063/1.3657865⟩. ⟨hal-00757379⟩
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