Etching of a-Si:H thin films by hydrogen plasma: A view from in situ spectroscopic ellipsometry - École polytechnique Access content directly
Journal Articles The Journal of Chemical Physics Year : 2014
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hal-01230706 , version 1 (18-11-2015)

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Aomar Hadjadj, Fadila Larbi, Mickaël Gilliot, Pere Roca I Cabarrocas. Etching of a-Si:H thin films by hydrogen plasma: A view from in situ spectroscopic ellipsometry. The Journal of Chemical Physics, 2014, 141 (8), ⟨10.1063/1.4893558⟩. ⟨hal-01230706⟩
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